Real-time Leak Detection, Endpoint Detection and Process Monitoring
INFICON Quantus HP100 gas analyzer is based on Self-Plasma Optical Emission Spectroscopy (SPOES) technology and is designed to provide real-time leak detection, endpoint detection and process monitoring during semiconductor manufacturing. Quantus HP100 has excellent sensitivity, a compact form factor and offers wide operational pressure range without costly pumps, making it well suited for process monitoring and protection in most semiconductor tools.
Features
- Operating range of 1 Torr – 450 Torr for Argon and 1 Torr – 120 Torr for Nitrogen (Varies for other gas species)
- Low detection limits <1 ppm
- Easy installation using a standard KF25 connection
- Fast sampling (20 Hz maximum)
- Small footprint (H x W x L): 6.4 x 6.0 x 8.3 in. [162 x 153 x 210 mm]
- Low maintenance, no pumps or consumables required
- Convenient field-replaceable plasma cell
- Worldwide expert support for your particular process needs
Specifications
| Operating pressure | 1 Torr – 450 Torr (application dependent) |
| Spectrometer performance | 200 to 850 nanometer wavelengths (UV-VIS) 16-bit full-scale resolution, 3648 pixels |
| Detection limit | < 1 ppm (application dependent) |
| Exposure time | Minimum of 1 ms |
| Vacuum fitting | KF25 |
Brochures & Data Sheets
Quantus HP100 Gas Analyzer Brochure